The 3 main advantages of plasma cleaning are:
1. It is a simple cleaning process at a molecular level. It passes a high voltage between electrodes in the vacuum chamber creating a plasma atmosphere. This accelerates the degassing of absorbed moisture, solvents and plasticisers leaving a contaminant free surface.
2. It improves adhesion between the component substrate and film to be deposited. This is done by breaking the molecular bonds on the substrate surface making it easier for the molecules of aluminium to attach to the component substrate.
3. It aids the successful lacquering of the component substrate. Increasing the surface energy of the substrate improves the ability of the lacquer to wet the surface. This allows the correct amount of plasma to be applied to give optimum results.